Print version: Nadhom, Hama Area Selective Chemical Vapor Deposition of Metallic Films Using Plasma Electrons As Reducing Agents Linkoping : Linkopings Universitet,c2021
Intro -- Abstract -- Popularvetenskaplig Sammanfattning -- edNU Yde j -- Preface -- Acknowledgement -- List of Articles -- Table of Contents -- 1. Introduction -- 2. Chemical Vapor Deposition -- 3. Area Selective CVD -- 4. Characterization Techniques -- 5.Contribution to the Field -- 6. Outlook -- References -- Papers.