Print version: Zhang, Hengfang Hot-Wall MOCVD of N-polar Group-III Nitride Materials and High Electron Mobility Transistor Structures Linkoping : Linkopings Universitet,c2022
Intro -- ABSTRACT -- POPULARVETENSKAPLIG SAMMANFATTNING -- PREFACE -- ACKNOWLEDGEMENT -- Contents -- Part I -- 1.1 Introduction -- 1.2 Fundamental properties of group-III nitrides -- 1.3 MOCVD -- 1.4 Epitaxy of N-polar III-Nitrides -- 1.5 Characterization techniques -- 1.6 Summary of main results -- Part II -- 2.1 Publications included in the thesis -- 2.2 Publications not included in the thesis.